Offered equipment - sputtering systems

LEYBOLD Z400 laboratory sputtering system

category : new built or retrofit custom special
status : available

System basis is a completely updated Leybold Z400 cathode sputtering system. The sputtering system will be optimized according to your wishes and can be equipped with:

maximum of four PK75 diode and/or magnetron sputtering cathodes (diameter 75 mm)
the cathodes can be build into the baseplate, rotator for up or down sputtering
one of the sputtering cathodes can be replaced by a heating- or heating/etching device
adjustable source-substrate distance (35 to 75 mm)
DC sputtering power supply and/or RF sputtering power supply with matchbox
substrate table with or without water cooling and with or without RF-bias/RF-etching
single or multi sputtering gas inlet system (for reactive sputtering)
quartz crystal film thickness and rate measuring system
PLC machine controller with an industrial PC based human machine interface according to your wishes
Operating voltage on request (208-380-400 VAC, 50/60 Hz.)

Vacuum pump system will be optimized according to your wishes:

rotary vane pump with turbomolecular pump
(optional with a LN2 cooling trap)
oil-free prevacuum pump with turbodrag pump
(optional with a LN2 cooling trap)
oil-free prevacuum pump with cryo pump

The sputtering system is completely retrofitted and will be equipped with vacuum pumps and vacuum measuring equipment corresponding to your wishes or company standardisation.

Please contact us for more detailed information...



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			Offered equipment - sputtering systems LEYBOLD Z400 laboratory sputtering system category : new built or retrofit custom special status : available System basis is a completely updated Leybold Z400 cathode sputtering system. The sputtering system will be optimized according to your wishes and can be equipped with: maximum of four PK75 diode and/or magnetron sputtering cathodes (diameter 75 mm) the cathodes can be build into the baseplate, rotator for up or down sputtering one of the sputtering cathodes can be replaced by a heating- or heating/etching device adjustable source-substrate distance (35 to 75 mm) DC sputtering power supply and/or RF sputtering power supply with matchbox substrate table with or without water cooling and with or without RF-bias/RF-etching single or multi sputtering gas inlet system (for reactive sputtering) quartz crystal film thickness and rate measuring system PLC machine controller with an industrial PC based human machine interface according to your wishes Operating voltage on request (208-380-400 VAC, 50/60 Hz.) Vacuum pump system will be optimized according to your wishes: rotary vane pump with turbomolecular pump (optional with a LN2 cooling trap) oil-free prevacuum pump with turbodrag pump (optional with a LN2 cooling trap) oil-free prevacuum pump with cryo pump The sputtering system is completely retrofitted and will be equipped with vacuum pumps and vacuum measuring equipment corresponding to your wishes or company standardisation. Please contact us for more detailed information...

			P.O. Box 639, 5550 AP Valkenswaard, Netherlands \| phone +31 (0)40 20 469 31 \| fax +31 (0)40 20 139 81 \| info@fergutec.com