new built or retrofit custom special
available
System basis is a completely updated Leybold Z550 cathode sputtering system. This is a semi-automatic sputtering system which will be optimized according to your wishes and can be equipped with:
- four PK150 diode and/or magnetron sputtering cathodes (diameter 150 mm) or three PK200 diode and/or magnetron sputtering cathodes (diameter 200 mm)
- one of the sputtering cathodes can be replaced by a heating device or RF etching device
- DC sputtering power supply and/or RF sputtering power supply with matchbox
- substrate table with or without water cooling and with or without RF-bias/RF-etching
- single or multi sputtering gas inlet system (for reactive sputtering)
- quartz crystal film thickness and rate measuring system or a optical thickness measuring system
- load lock
- PLC machine controller with an industrial PC based human machine interface according to your wishes
- Operating voltage on request (208-380-400 VAC, 50/60 Hz.)
Vacuum pump system will be optimized according to your wishes:
- rotary vane pump with turbomolecular pump
(optional with a LN2 cooling trap)
- oil-free prevacuum pump with turbodrag pump
(optional with a LN2 cooling trap)
- oil-free prevacuum pump with cryopump
The sputtering system is completely retrofitted and will be equipped with vacuum pumps and vacuum measuring equipment according to your wishes or company standardisation.
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