Offered equipment - sputtering systems

LEYBOLD Z600 / Z650 sputtering system

category : new built or retrofit custom special
status : available

System basis are completely updated modules of the Leybold Z600 / Z650 cathode sputtering system combined with a load-lock module. This is an automatic sputtering system which will be optimized according to your wishes and can be equipped with:

process modules for load-lock module combinations
four PK150 diode and/or magnetron sputtering cathodes (diameter 150 mm) or three PK200 diode and/or magnetron sputtering cathodes (diameter 200 mm) a process module
one of the sputtering cathodes can be replace by a heating device or RF etching device
DC sputtering power supply and/or RF sputtering power supply with matchbox
substrate table with or without RF-bias/RF-etching
single or multi sputtering gas inlet system (for reactive sputtering)
quartz crystal film thickness and rate measuring system or a optical thickness measuring system
PLC machine controller with an industrial PC based human machine interface according to your wishes
operating voltage on request (208-380-400 VAC, 50/60 Hz.)

Vacuum pump system will be optimized according to your wishes:

rotary vane pump with turbomolecular pump
(optional with a LN2 cooling trap)
oil-free prevacuum pump with turbodrag pump
(optional with a LN2 cooling trap)
oil-free prevacuum pump with cryopump

The sputtering system is completely retrofitted and will be equipped with vacuum pumps and vacuum measuring equipment corresponding to your wishes or company standardisation.

Please contact us for more detailed information...



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			Offered equipment - sputtering systems LEYBOLD Z600 / Z650 sputtering system category : new built or retrofit custom special status : available System basis are completely updated modules of the Leybold Z600 / Z650 cathode sputtering system combined with a load-lock module. This is an automatic sputtering system which will be optimized according to your wishes and can be equipped with: process modules for load-lock module combinations four PK150 diode and/or magnetron sputtering cathodes (diameter 150 mm) or three PK200 diode and/or magnetron sputtering cathodes (diameter 200 mm) a process module one of the sputtering cathodes can be replace by a heating device or RF etching device DC sputtering power supply and/or RF sputtering power supply with matchbox substrate table with or without RF-bias/RF-etching single or multi sputtering gas inlet system (for reactive sputtering) quartz crystal film thickness and rate measuring system or a optical thickness measuring system PLC machine controller with an industrial PC based human machine interface according to your wishes operating voltage on request (208-380-400 VAC, 50/60 Hz.) Vacuum pump system will be optimized according to your wishes: rotary vane pump with turbomolecular pump (optional with a LN2 cooling trap) oil-free prevacuum pump with turbodrag pump (optional with a LN2 cooling trap) oil-free prevacuum pump with cryopump The sputtering system is completely retrofitted and will be equipped with vacuum pumps and vacuum measuring equipment corresponding to your wishes or company standardisation. Please contact us for more detailed information...

			P.O. Box 639, 5550 AP Valkenswaard, Netherlands \| phone +31 (0)40 20 469 31 \| fax +31 (0)40 20 139 81 \| info@fergutec.com