Offered equipment - sputtering systems

LEYBOLD ZV1200 sputtering system

category : new built or retrofit custom special
status : available

System basis are completely updated modules of the Leybold ZV1200 cathode sputtering system. The system is an automatic vertical sputtering system which will be optimized according to your wishes and can be equipped with:

combined load lock / exit module (single ended configuration)
separated load lock and exit module with carrier return0
(inline configuration)
heating or plasma cleaning module
one or several process modules separated by valves
1- 2 x pieces 750 x 88mm or 750 x 125 mm diode and/or magnetron sputtering cathodes
single or multi sputtering gas inlet system (for reactive sputtering)
quartz crystal film thickness
vertical substrate carrier for substrate dimensions up to 575 x 710 mm
carrier transport system in the top or bottom of the process chamber
PLC machine controller with an industrial PC based human machine interface according to your wishes
operating voltage on request (208-380-400 VAC, 50/60 Hz.)

Vacuum pump system will be optimized according to your wishes:

rotary vane pump with turbomolecular pump
(optional with a LN2 cooling trap)
oil-free prevacuum pump with turbodrag pump
(optional with a LN2 cooling trap)
oil-free prevacuum pump with cryo pump

The sputtering system is completely retrofitted and will be equipped with vacuum pumps and vacuum measuring equipment corresponding to your wishes or company standardisation.

Please contact us for more detailed information...



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			Offered equipment - sputtering systems LEYBOLD ZV1200 sputtering system category : new built or retrofit custom special status : available System basis are completely updated modules of the Leybold ZV1200 cathode sputtering system. The system is an automatic vertical sputtering system which will be optimized according to your wishes and can be equipped with: combined load lock / exit module (single ended configuration) separated load lock and exit module with carrier return0 (inline configuration) heating or plasma cleaning module one or several process modules separated by valves 1- 2 x pieces 750 x 88mm or 750 x 125 mm diode and/or magnetron sputtering cathodes single or multi sputtering gas inlet system (for reactive sputtering) quartz crystal film thickness vertical substrate carrier for substrate dimensions up to 575 x 710 mm carrier transport system in the top or bottom of the process chamber PLC machine controller with an industrial PC based human machine interface according to your wishes operating voltage on request (208-380-400 VAC, 50/60 Hz.) Vacuum pump system will be optimized according to your wishes: rotary vane pump with turbomolecular pump (optional with a LN2 cooling trap) oil-free prevacuum pump with turbodrag pump (optional with a LN2 cooling trap) oil-free prevacuum pump with cryo pump The sputtering system is completely retrofitted and will be equipped with vacuum pumps and vacuum measuring equipment corresponding to your wishes or company standardisation. Please contact us for more detailed information...

			P.O. Box 639, 5550 AP Valkenswaard, Netherlands \| phone +31 (0)40 20 469 31 \| fax +31 (0)40 20 139 81 \| info@fergutec.com